MASK TARGETING EUV LIGHT SOURCE: FEL TECHNOLOGY FAVORS CHIP COSTS OR CHANGES

ON 10 AUGUST, FOLLOWING THE CONSTRUCTION OF CARS, ROCKETS AND HUMAN-SHAPED ROBOTS, MASK WAS PROJECTING ITS EYES TOWARDS THE CORE OF THE CHIP PRODUCTION, THE EUV LIGHT SOURCE. MASK HAS EXPRESSED A CLEAR PREFERENCE FOR FREE ELECTRONIC LASERS (FEL) OVER THE CURRENT MATURE COMMERCIAL PLASMA GENERATION (LPP) LIGHT SOURCE TECHNOLOGY. FREE ELECTRONIC LASER (FEL) THEORETICALLY CAN SIGNIFICANTLY REDUCE THE COST OF PRODUCING ADVANCED CHIPS, BUT IS STILL AT AN EARLY STAGE OF DEVELOPMENT。