Russia built 150 nanometers of light at a level equivalent to 4 20 years ago

On 22 July, according to fast technology, the ZNCC of the Green City of Russia has successfully developed a prototype of an electronic beam-based optical carving machine (ELL) designed at 150 nm. The project is part of the research and development priorities of the Russian State programme for the development of science and technology, codenamed Progress ELL 150. The equipment is used mainly for photo masks and can also be used to map the circuits directly on the base panel without using the mask. The 150 nanometer process roughly corresponds to the performance level of Intel Ben Tent 4 20 years ago. In 2025, ZNCC demonstrated 350 nano-resolution similar equipment, which is now advancing to 90 and 130 nano-technology nodes. Industry experts noted that such equipment was suitable only for small quantities of specialized chips in areas such as space and defence。